Location History:
- Taipei, TW (2002)
- Danville, CA (US) (2003 - 2006)
Company Filing History:
2 out of 96 
1 out of 5 
1 out of 832,912 Years Active: 2002-2006
Title: William John Nelson: Innovator in Semiconductor Technology
Introduction
William John Nelson is a notable inventor based in Danville, CA (US), recognized for his contributions to semiconductor technology. He holds a total of 4 patents, showcasing his innovative spirit and technical expertise in the field.
Latest Patents
Among his latest patents is the "Trench DMOS device with improved drain contact." This invention describes a trench DMOS transistor device that includes a substrate of a first conductivity type, an epitaxial layer, and a trench extending into the epitaxial layer. The design allows for source, drain, and gate contacts to be provided on a single surface of the device, enhancing its efficiency and functionality. Another significant patent is the "Apparatus for attaching resists and wafers to substrates." This invention outlines a comprehensive apparatus that facilitates the attachment of resists and wafers to substrates, incorporating various moving devices, adhesive agents, and a mold for arranging resists.
Career Highlights
William has worked with prominent companies such as General Semiconductor, Inc. and General Semiconductor of Taiwan, Ltd. His experience in these organizations has contributed to his development as an inventor and innovator in the semiconductor industry.
Collaborations
Throughout his career, William has collaborated with notable individuals, including Fwu-Iuan Hshieh and Koon Chong So. These partnerships have likely enriched his work and led to further advancements in his inventions.
Conclusion
William John Nelson's contributions to semiconductor technology through his patents and collaborations highlight his significant role as an inventor. His innovative designs continue to impact the industry and inspire future advancements.