Burnt Hills, NY, United States of America

William D Kray


Average Co-Inventor Count = 1.4

ph-index = 7

Forward Citations = 130(Granted Patents)


Location History:

  • San Bernadino, CA (US) (1986)
  • Burnt Hills, NY (US) (1981 - 1988)

Company Filing History:


Years Active: 1981-1988

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9 patents (USPTO):Explore Patents

Title: The Innovations of William D Kray

Introduction

William D Kray, an inventive mind hailing from Burnt Hills, NY, has significantly contributed to the field of semiconductor technology through his nine patents. His works primarily focus on the purification of silicon halides and photopatternable polyimide compositions.

Latest Patents

Among his latest patents, the method for the purification of silicon halides stands out. This innovation discloses a selective approach for the removal of boron halides and other Lewis acid-type impurities from silicon halides. By treating contaminated silicon halides with siloxanes that react with the impurities, the resulting distillation yields silicon halide which is virtually free from contamination within extremely low limits of detectability. Additionally, he has developed photopatternable polyimide compositions and methods for their production, enhancing the flexibility of material applications in electronics.

Career Highlights

Throughout his career, William D Kray has worked with notable companies such as General Electric Company, cementing his position as a skilled inventor in his field. His patents reflect a commitment to advancing technology and improving existing manufacturing processes.

Collaborations

In his journey as an inventor, Kray has collaborated with esteemed colleagues including Rack H Chung and John S Razzano. These collaborations have undoubtedly enriched his research and development efforts, leading to innovations that impact various sectors.

Conclusion

William D Kray is a distinguished inventor whose contributions to silicon halide purification and polyimide compositions have pushed the boundaries of semiconductor technology. His dedication to innovation continues to inspire future advancements in the field.

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