William C Metzger

Title: The Innovations of William C Metzger

Introduction

William C Metzger is a notable inventor based in Beacon, NY (US). He has made significant contributions to the field of technology, particularly in the area of reactive ion etching. His work has implications for various applications in semiconductor manufacturing and materials science.

Latest Patents

Metzger holds a patent for a process titled "Reactive ion etching of aluminum." This innovative method involves etching aluminum by exposing a masked layer of aluminum, supported on a substrate, to a plasma formed by imposing an RF voltage across at least two spaced electrodes. The ambient includes gases such as CCl.sub.4, Cl.sub.2, Br.sub.2, and HCl. The conditions created provide a reactive environment where aluminum is bombarded with chlorine or bromine ions. This reaction results in the formation of aluminum chloride or bromide compounds, which are volatile at the temperature of the sputtered substrate.

Career Highlights

Metzger's career is marked by his association with the International Business Machines Corporation (IBM). His work at IBM has allowed him to explore and develop advanced technologies that enhance manufacturing processes. His innovative approach has contributed to the company's reputation as a leader in technology and innovation.

Collaborations

Throughout his career, Metzger has collaborated with notable colleagues, including Joseph M Harvilchuck and Joseph S Logan. These collaborations have fostered an environment of innovation and have led to advancements in their respective fields.

Conclusion

William C Metzger's contributions to the field of reactive ion etching demonstrate his innovative spirit and commitment to advancing technology. His patent and work at IBM highlight the importance of collaboration and creativity in driving progress in the industry.