The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 1976
Filed:
May. 22, 1975
Joseph M Harvilchuck, Billings, NY (US);
Joseph S Logan, Poughkeepsie, NY (US);
William C Metzger, Beacon, NY (US);
Paul M Schaible, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process for etching aluminum wherein a masked layer of aluminum, supported on a substrate, is exposed to a plasma formed by imposing an RF voltage across at least two spaced electrodes in an ambient including a gas selected from the group consisting of CCl.sub.4, Cl.sub.2, Br.sub.2, HCl. The resultant conditions provide a reactive environment where the aluminum is bombarded with chlorine or bromine ions. The aluminum reacts with chlorine or bromine ions to form an aluminum chloride or bromide compound, which is volatile at the temperature of the sputtered substrate.