William C Lester

Title: The Innovations of William C. Lester

Introduction

William C. Lester is a notable inventor based in Los Gatos, California. He has made significant contributions to the field of sputter deposition techniques, particularly through his innovative patent. His work has implications for various industries that require precise thin film coatings.

Latest Patents

Lester holds a patent for a "Two-sided bias sputter deposition method and apparatus." This invention describes a method and apparatus for coating a thin film upon a substrate in a vacuum chamber. The unique aspect of this technique is that it allows for sputter deposition on both sides of the substrate without the need for rotation. The substrate is held between two movable rams, which supply power and cooling. Additionally, the sputtering system can be enhanced magnetically to concentrate the sputtering plasma, making it a valuable advancement in the field.

Career Highlights

William C. Lester is associated with the International Business Machines Corporation, commonly known as IBM. His role at IBM has allowed him to work on cutting-edge technologies and contribute to the company's reputation for innovation. His patent reflects his expertise and commitment to advancing sputter deposition methods.

Collaborations

Lester has collaborated with notable colleagues, including John D. Michaelsen and Thomas N. Kennedy. These collaborations have likely enriched his work and contributed to the development of innovative solutions in the field.

Conclusion

William C. Lester's contributions to sputter deposition technology exemplify the spirit of innovation. His patent demonstrates a significant advancement in the method of thin film coating, showcasing his expertise and dedication to the field.