The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 1980

Filed:

Dec. 22, 1978
Applicant:
Inventors:

Thomas N Kennedy, San Jose, CA (US);

William C Lester, Los Gatos, CA (US);

George W McDonough, Cupertino, CA (US);

John D Michaelsen, Los Gatos, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 204298 ;
Abstract

Method and apparatus for coating a thin film upon a substrate in a vacuum chamber using the sputter deposition technique on both sides of the substrate without rotation of the substrate. The substrate is held between two movable rams and is located between two targets equal to or larger in size than the substrate. The rams supply power and cooling to the substrate. A glow suppression ring circumscribes the periphery of the substrate. The cathodes of the sputtering system can be magnetically enhanced for concentration of the sputtering plasma.


Find Patent Forward Citations

Loading…