This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1995-1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kanagawa, JP (1995)
- Kanagawa-Ken, JP (1996)
Company Filing History:
Years Active: 1995-1996
Title: The Innovations of William Borland
Introduction
William Borland is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of thick film resistor compositions. With a total of 2 patents to his name, Borland's work has advanced the technology used in electronic components.
Latest Patents
Borland's latest patents include a thick film resistor composition containing pyrochlore. This invention focuses on providing a thick film resistor composition with a low length effect of temperature coefficient of resistance (TCR). The composition includes at least one oxide of ruthenium and a ruthenium pyrochlore oxide as a conducting component, with 0.02-5.0 wt. % of silver incorporated. Another patent involves a thick film resistor composition that minimizes variations in resistance and TCR during the firing step, while also ensuring a low thermal coefficient of expansion. This composition contains 5-30 wt. % of a ruthenium pyrochlore oxide and 10-90 wt. % of a glass binder.
Career Highlights
William Borland is currently employed at E.I. DuPont de Nemours and Company, where he continues to innovate in the field of electronic materials. His work has been instrumental in developing advanced resistor technologies that are crucial for modern electronics.
Collaborations
Throughout his career, Borland has collaborated with notable colleagues such as Keiichiro Hayakawa and Jerome D. Smith. These collaborations have further enriched his research and development efforts.
Conclusion
William Borland's contributions to thick film resistor technology demonstrate his commitment to innovation in the electronics industry. His patents reflect a deep understanding of materials science and engineering, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
