Poughkeepsie, NY, United States of America

William A Pliskin


Average Co-Inventor Count = 3.3

ph-index = 7

Forward Citations = 468(Granted Patents)


Company Filing History:


Years Active: 1977-1990

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7 patents (USPTO):

Title: The Innovations of William A. Pliskin in Chem-Mech Polishing

Introduction: William A. Pliskin is an esteemed inventor based in Poughkeepsie, NY, known for his contributions to advanced materials and semiconductor processing. With a total of seven patents to his name, Pliskin has significantly impacted the industry through innovative techniques that enhance the production of coplanar metal/insulator films.

Latest Patents: Among his notable inventions is a breakthrough chem-mech polishing method aimed at producing coplanar metal/insulator films. This method involves coating a substrate with a layered metal and removing metal from specific areas while leaving it intact in holes, thanks to the use of an improved selective slurry. This unique approach not only maximizes efficiency but also allows the insulating layer to function as an automatic etch stop barrier. Another recent advancement by Pliskin is the process of achieving deep dielectric isolation using fused glass. By forming trenches through reactive ion etching and filling them with a specially matched glass material, he has enabled the production of highly effective deep dielectric isolation zones.

Career Highlights: William A. Pliskin has dedicated his career to pushing the boundaries of technology at International Business Machines Corporation (IBM). His extensive work has led to numerous patents focusing on improving semiconductor manufacturing techniques, which are crucial for modern electronics.

Collaborations: Throughout his career, Pliskin has collaborated with notable coworkers such as Jacob Riseman and Joseph F. Shepard. Their combined expertise has fostered an environment of innovation, propelling technological advancements in the field.

Conclusion: William A. Pliskin's ingenious inventions and commitment to excellence have made a lasting impact on the semiconductor industry. His innovative methods, particularly in chem-mech polishing and dielectric isolation, continue to influence the development of advanced materials and manufacturing techniques. As he progresses in his career, the contributions made by Pliskin and his collaborators promise to shape the future of technology.

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