William A Barrow

Title: Innovations by William A Barrow: A Pioneer in Atomic Layer Deposition

Introduction: William A Barrow, an accomplished inventor based in Beaverton, OR, has made significant strides in the field of atomic layer deposition (ALD), holding a remarkable 19 patents. His work has paved the way for advancements in coating flexible substrates, showcasing his innovative approach to materials science and engineering.

Latest Patents: Barrow's latest patents focus on novel methods for atomic layer deposition. One patent describes an atomic layer deposition method utilizing multiple precursor zones for coating flexible substrates. This invention involves guiding the substrate back and forth between spaced-apart precursor zones, allowing for multiple transits through each zone. The system incorporates turning guides that support the substrate along an undulating transport path, enhancing the efficiency of the coating process.

Another noteworthy patent addresses atomic layer deposition for flexible substrates, employing a similar methodology with an emphasis on maintaining the integrity of precursor gases. The designs include flow-restricting passageways and the injection of inert gases to inhibit unwanted gas migration. Furthermore, Barrow has explored the potential for utilizing multiple precursor chemicals and methods for recycling exhausted precursor gases, broadening the scope of atomic layer deposition technology.

Career Highlights: Throughout his career, Barrow has contributed to significant technological advancements in the field of atomic layer deposition. Working with leading companies, he has leveraged his expertise to drive innovation and enhance product capabilities. His tenure at Lotus Applied Technology, LLC and Planar Systems, Inc. has established him as a key figure in the development of flexible substrate technologies.

Collaborations: Collaboration has been a crucial element of Barrow's success. He has worked alongside esteemed colleagues, including Eric R Dickey and Richard T Tuenge. These partnerships have fueled the creative process, enabling the exchange of ideas and fostering the development of groundbreaking technologies that impact the industry.

Conclusion: William A Barrow's contributions to the field of atomic layer deposition are invaluable, with his 19 patents reflecting a deep commitment to innovation. His latest advancements in coating flexible substrates demonstrate a clear understanding of the complexities of material science, setting the stage for future developments. As he continues to push the boundaries of technology, Barrow remains an inspiring figure for aspiring inventors and researchers in the field.