Lotus Applied Technology, LLC

Planar Systems, Inc.

Westinghouse Electric Corporation

Other

Via Optronics Gmbh

William A Barrow

Eric R Dickey

Richard T Tuenge

David Leksell

Christopher N King

Carl W Laakso

Juris A Asars

Henry Anthony Wehrli, Iii

Richard Schmachtenberg, Iii

Zoltan K Kun

Norman J Phillips

Robert T Flegal

Tin Nguyen

Richard E Coovert

Brian J Dolinar

Mark S Kruskopf

Ronald O Petersen

Laurin G Blacken

Andrew Mitchell Robinson

Maria Emma Crouser

Hal Merritt

Wayne Patrick Gentry

Paul E Gulick

Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.

Atomic layer deposition method utilizing multiple precursor zones for coating flexible substrates

Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.

Atomic layer deposition method for coating flexible substrates

Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate.

Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system

A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O.), generated from an oxygen-containing second precursor gas, while maintaining spatial or temporal separation of the radicals and the first precursor gas. Simplified reactor designs and process control are possible when the first and second precursor gases are nonreactive under normal processing conditions and can therefore be allowed to mix after the radicals recombine or otherwise abate. In some embodiments, the second precursor gas is an oxygen-containing compound, such as carbon dioxide (CO) or nitrous oxide (NO) for example, or a mixture of such oxygen-containing compounds, and does not contain significant amounts of normal oxygen (O).

Oxygen radical generation for radical-enhanced thin film deposition

Atomic layer deposition system utilizing multiple precursor zones for coating flexible substrates

A radical-enhanced atomic layer deposition (REALD) system and method involves moving a substrate along a circulating or reciprocating transport path between zones that provide alternating exposure to a precursor gas and a gaseous radical species. The radical species may be generated in-situ within a reaction chamber by an excitation source such as plasma generator or ultraviolet radiation (UV), for example. The gaseous radical species is maintained in a radicals zone within the reaction chamber while a precursor gas is introduced into a precursor zone. The precursor zone is spaced apart from the radicals zone to define a radical deactivation zone therebetween. Purge gas flowing through the various zones may provide flow and pressure conditions that substantially prevent the precursor gas from flowing into the radicals zone. In some embodiments, the system includes a partition having one or more flow-restricting passageways though which the substrate is transported.

Radical-enhanced atomic layer deposition system and method

Atomic layer deposition system for coating flexible substrates

Methods of constructing composite films including particles embedded in a filler matrix involve preparing a collection of stacked particles, then depositing a matrix material throughout the particle collection using an atomic layer deposition (ALD) method so as to substantially completely fill the spaces between the particles with the matrix material. During matrix deposition, a vapor phase etch cycle may be periodically employed to avoid clogging of small pores in the particle collection. New composite materials formed by such methods are also disclosed.

Fabrication of composite materials using atomic layer deposition

A tool for use in affixing an optical component, such as glass, to a liquid crystal display (LCD) using a silicone gel mixture includes, in one embodiment, a unitary metallic platen that is shaped to define a central window. A narrow shelf is defined around the central window to support the optical component during the application of the silicone gel thereon. A upwardly extending partition is formed onto the top surface of the platen around the shelf to retain the optical component fixed in place on the platen during the assembly process. A plurality of identical, spaced apart, upwardly extending standoffs are formed onto the free end of the partition to support the LCD a fixed distance away from the optical component. In this manner, the standoffs ensure that the layer of silicone gel deposited between the optical component and the LCD is uniform in thickness to optimize performance.

Tool for use in affixing an optical component to a liquid crystal display (LCD)

A thin film electroluminescent device has a bottom substrate and a first electrode layer deposited on the bottom substrate. The first insulating layer is deposited on the first electrode layer. A phosphor layer is deposited on the first insulating layer. A second insulating layer is deposited on the phosphor layer. A second electrode layer is deposited on the second insulating layer. In one aspect of the invention, at least a portion of the first insulating layer includes a layer of aluminum titanium oxide, and at least a portion of the second insulating layer includes a layer of a fusing dielectric material. In another aspect of the invention, the first insulating layer includes a layer of a refractory metal oxide, and the second insulating layer includes a layer of a fusing dielectric material.

TFEL devices having insulating layers

A full color TFEL display includes stacked panels emitting blue and a combination of red and green light. The panel nearest the viewer employs transparent electrodes on both sides and an insulator bridge structure for the scanning electrodes that alleviates the effect of pinhole defects. The panel farthest from the viewer employs transparent-top electrodes. Each row electrode on the scanning side includes an insulator bridge extending across the panel and then ITO pads extending laterally of the bridge onto the EL stack to form sub pixel points. A bus bar connects all the pixel pads in a row and provides the scanning voltage. The insulator bridge prevents the bus bars from shorting out and permits the pixel pads to fuse open in the event of a short circuit.

Dual substrate full color TFEL panel with insulator bridge structure

A TFEl structure has a multi-layer construction which includes a bottom substrate layer, a lower electrode layer, a middle EL stack, and an upper electrode layer. Forward portions of the EL stack and the lower and upper electrode layers have formed therethrough a series of longitudinal channels and a transverse street connecting the channels and extending along a forward edge of the bottom substrate layer so as to define a plurality of pixels having light-emitting front edges setback from the forward edge of the bottom substrate layer by the width of the street. Rearward portions of the lower and upper electrode layers respectively underlie and overlie a rearward portion of the EL stack but not each other so as to electrically isolate the rearward portions of the lower and upper electrode layers from one another. Also, a bus bar layer overlies the rearward portion of the EL stack and crosses the rearward portion of the upper electrode layer. An insulation layer is interposed between the rearward portions of the bus bar layer and upper electrode layer. Selected portions of the bus bar layer and upper electrode layer are electrically connected together through the insulation layer.

Multi-layer structure and method of constructing the same for providing

A thin film electroluminescent (TFEL) edge emitter module and packaging assembly is composed of a TFEL edge emitter module including an electroluminescent (EL) stack having a linear array of spaced-apart pixels with light-emitting front edges, an enclosure defining a sealed cavity which encloses at least a portion of the EL stack so as to sealably enclose the array of pixels in a contaminant-free environment, a thermally expansive and contractive liquid substantially filling the sealed cavity, and a cavity capacity expansion and contraction mechanism disposed in the enclosure in communication with the cavity and the liquid therein. In response to thermal expansion of the volume of the liquid filling the cavity, the capacity expansion and contraction mechanism is operable to change from a first condition toward a second condition and thereby increase the liquid-holding capacity of the enclosure cavity. Further, in response to thermal contraction of the volume of the liquid, the mechanism is operable to change from the second condition back toward the first condition and thereby decrease the liquid-holding capacity of the enclosure cavity. In such manner, the enclosure cavity liquid-holding capacity is continually maintained substantially equivalent to the enclosed volume of liquid filling the cavity.

TFEL edge emitter module and packaging assembly employing sealed cavity

A process for manufacturing a TFEL panel having a plurality of side-by-side phosphor stripes of different colors includes the steps of placing a thin film phosphor layer of a first color producing phosphor on top of transparent electrodes covered by an insulator and subjecting the phosphor to an etching process to leave thin elongate stripes. A second phosphor layer is deposited over the first phosphor stripes and the etch is repeated to leave adjacent stripes of a second color-producing phosphor. An insulating layer and a second set of electrodes are placed atop the stripes to complete the panel which is supported on a glass substrate.

Phosphor only etching process for TFEL panel having multiple-colored

A solid filler material is used to encapsulate active TFEL components supported by a substrate and disposed within a cavity. The cavity is created by affixing a rear cover plate to the substrate. The filler material is injected into the cavity as a liquid but cures to a solid under the influence of heat. This provides an effective moisture barrier and enhances the structural integrity of the panel rendering it immune to problems caused by changes in air pressure or caused by vibration.

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Beaverton, OR, United States of America

William A Barrow