This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990
Title: Wilhelmina C Snels: Innovator in Semiconductor Manufacturing
Introduction
Wilhelmina C Snels is a notable inventor based in Eindhoven, Netherlands. She has made significant contributions to the field of semiconductor manufacturing. Her innovative methods have paved the way for advancements in technology.
Latest Patents
Wilhelmina holds a patent for a method of manufacturing a semiconductor device. This patent describes a process in which a silicon wafer is locally provided with an oxidation mask. The wafer is then subjected to an oxidation treatment by heating it in an oxidizing gas mixture. The invention specifies that the wafer is heated to a temperature between 950°C and 1050°C during the treatment. Water is added to the oxidizing gas mixture, initially at less than 30% by volume, and later increased. This method allows for the formation of a comparatively thick layer of oxide without defects in the underlying silicon.
Career Highlights
Wilhelmina is associated with U.S. Philips Corporation, where she has contributed her expertise in semiconductor technology. Her work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.
Collaborations
Wilhelmina has collaborated with Paulus A Van Der Plas, furthering her research and development efforts in the semiconductor field.
Conclusion
Wilhelmina C Snels is a pioneering inventor whose work in semiconductor manufacturing has had a lasting impact on the industry. Her innovative methods continue to influence advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile