Company Filing History:
Years Active: 2023
Title: Weoun Gyuen Moon: Innovator in Chemical-Mechanical Polishing Technology
Introduction
Weoun Gyuen Moon is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of chemical-mechanical polishing (CMP) technology. His innovative work focuses on enhancing the quality and efficiency of polishing processes used in various industries.
Latest Patents
Weoun Gyuen Moon holds 1 patent for his invention titled "Chemical-mechanical polishing particle and polishing slurry composition comprising same." This patent presents CMP particles that exhibit a high polishing rate and quality, minimizing defects and scratches due to their modified surface. The accompanying polishing slurry composition further enhances the effectiveness of these particles in industrial applications.
Career Highlights
Moon is currently employed at Dongjin Semichem Co., Ltd., where he continues to develop advanced polishing technologies. His work has positioned him as a key player in the semiconductor and materials processing industries. His innovative approaches have garnered attention for their potential to improve manufacturing processes.
Collaborations
Some of his coworkers include Jae Hyun Kim and Kyu Soon Shin, who contribute to the collaborative environment at Dongjin Semichem Co., Ltd. Their combined expertise fosters innovation and drives the development of cutting-edge polishing solutions.
Conclusion
Weoun Gyuen Moon's contributions to chemical-mechanical polishing technology highlight his role as an influential inventor in the field. His patented innovations continue to impact the industry positively, showcasing the importance of research and development in advancing technology.