Osan-si, South Korea

Weon-Sik Oh



Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 47(Granted Patents)


Location History:

  • Yongin-si, KR (2009)
  • Suwon-si, KR (2004 - 2012)
  • Osan-si, KR (2004 - 2019)

Company Filing History:


Years Active: 2004-2019

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12 patents (USPTO):Explore Patents

Title: Innovations of Inventor Weon-Sik Oh

Introduction: Weon-Sik Oh, a notable inventor based in Osan-si, South Korea, has made significant contributions to the field of display technologies, holding 12 patents to date. His pioneering work in display apparatuses and photoalignment compounds has positioned him as a key figure in the tech industry.

Latest Patents: Among his latest innovations is a display apparatus that features a display panel with a pixel electrode and multiple first signal lines that transmit driving signals. This apparatus includes a conductive member with a resin layer and a second signal line that connects with one of the first signal lines through an opening in the resin. Additionally, Weon-Sik Oh has developed a photoalignment compound, a photoalignment composition, and a display substrate with an alignment layer which significantly enhances manufacturing processes for display substrates.

Career Highlights: Weon-Sik Oh has been associated with leading companies like Samsung Electronics Co., Ltd. and Samsung Display Co., Ltd., where he has played a crucial role in advancing display technology. His work has not only contributed to the company’s innovations but also to the overall growth of the industry.

Collaborations: Throughout his career, Weon-Sik Oh has collaborated with esteemed colleagues such as Seong-Yong Hwang and Ju-Young Yoon. Their collaborative efforts have resulted in groundbreaking advancements in display technologies.

Conclusion: Inventor Weon-Sik Oh continues to be a driving force in the innovations related to display technology. With a strong portfolio of patents and collaboration with prominent professionals in the industry, he has made lasting impacts that will influence future developments in the field.

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