Quanzhou, China

Wenzhang Li

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Fujian Jinhua Integrated Circuit Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenzhang Li. Retrieved from https://idiyas.com/inventor/wenzhang-li

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Wenzhang Li: Innovator in Semiconductor Fabrication

Introduction

Wenzhang Li is a notable inventor based in Quanzhou, China. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for fabricating semiconductor layouts and structures.

Latest Patents

Wenzhang Li holds a patent for a method of fabricating a semiconductor layout and a semiconductor structure. This patent outlines a process that includes providing a layout with multiple connection patterns. The connection patterns are decomposed into first and second connection patterns that are alternately arranged. An optical proximity correction process is applied to these patterns, resulting in improved photomasks with more accurate patterns and contours. This advancement enhances the quality of semiconductor manufacturing.

Career Highlights

Wenzhang Li is currently employed at Fujian Jinhua Integrated Circuit Co., Ltd. His work at this company has allowed him to focus on semiconductor innovations. His expertise in this area has positioned him as a valuable asset in the industry.

Collaborations

Wenzhang Li collaborates with Yifei Yan, a fellow professional in the semiconductor field. Their partnership contributes to the advancement of technology and innovation within their company.

Conclusion

Wenzhang Li's contributions to semiconductor fabrication demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in the industry, showcasing his expertise and dedication to improving semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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