This inventor holds 1 USPTO granted patent and 7 published patent applications, plus 1 CIPO patent. Top assignees: Esk-Sic Gmbh, Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Wenzel Klietz: Innovator in Silicon Carbide Purification
Introduction
Wenzel Klietz is a notable inventor based in Frechen, Germany. He has made significant contributions to the field of materials science, particularly in the purification of silicon carbide. His innovative methods have the potential to enhance the quality and usability of silicon carbide powders.
Latest Patents
Klietz holds a patent for a method for separating impurities from silicon carbide, specifically applicable to SiC powders derived from grinding sludges and temperature-treated silicon carbide powder. This method effectively removes various impurities from pulverulent SiC waste products, which contain a SiC mass percentage of at least 50% and an average grain size ranging from 0.5 to 1000 μm. The process involves mechanically treating and physically separating the SiC powder into two fractions, with one fraction containing a mass of impurities that is at least double that of the other fraction.
Career Highlights
Throughout his career, Wenzel Klietz has worked with prominent organizations, including the Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V. and Esk-Sic GmbH. His work in these institutions has allowed him to develop and refine his innovative methods for silicon carbide purification.
Collaborations
Klietz has collaborated with notable colleagues such as Jörg Adler and Heike Heymer. These partnerships have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Wenzel Klietz is a distinguished inventor whose work in silicon carbide purification has made a significant impact in the field. His innovative methods and collaborations with esteemed organizations and colleagues highlight his dedication to advancing materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile