Wenlin Mei

Title: The Innovations of Wenlin Mei

Introduction

Wenlin Mei is a prominent inventor based in Beijing, China. He has made significant contributions to the field of display technology, holding a total of 2 patents. His work focuses on innovative methods and apparatuses that enhance the manufacturing and testing of display panels.

Latest Patents

Wenlin Mei's latest patents include a mask and method for manufacturing the same, as well as an exposure system, method for manufacturing a display substrate, and display device. The mask features a first light-transmitting portion that includes a target region and at least one compensation region connected to the target region. The planar pattern of the target region consists of multiple corners, while the compensation regions extend from these corners, with their areas being smaller than that of the target region. Additionally, he has developed an apparatus for picture testing of display panels, which includes a first scanning unit, a second scanning unit, a data signal source, and a controller. This apparatus is designed to efficiently test pixel units in display panels by utilizing different data lines for odd and even numbered rows.

Career Highlights

Wenlin Mei has worked with notable companies in the display technology sector, including Chongqing BOE Optoelectronics Technology Co., Ltd. and BOE Technology Group Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in display technology.

Collaborations

Wenlin Mei has collaborated with several professionals in his field, including Shouqiang Zhang and Zhuo Xu. These collaborations have likely fostered innovation and the sharing of ideas, further enhancing the development of new technologies.

Conclusion

Wenlin Mei's contributions to display technology through his patents and career experiences highlight his role as an influential inventor. His innovative approaches continue to shape the future of display manufacturing and testing.