Wenjun Xia

Title: Wenjun Xia and Diffusion-Based Metal Artifact Reduction in Medical Imaging.

Introduction

Wenjun Xia is an inventor associated with Troy, New York. His patent work addresses a challenge in computed tomography (CT): reducing image artifacts caused by metal objects in a patient.

Latest Patents

The provided information lists one patent for Xia: “System and Method for Metal Artifact Reduction in Medical Images Using a Denoising Diffusion Probabilistic Model.” The invention describes generating a corrupted CT sinogram and a mask that identifies data affected by metal artifacts. A denoising diffusion probabilistic model then uses the corrupted sinogram and mask to inpaint the affected region, producing a corrected sinogram. From this, the system generates a CT image with reduced artifacts compared with the original image. The approach is intended to support clearer medical images when metal objects interfere with CT data.

Career Highlights

Xia’s listed affiliations include GE Precision Healthcare LLC and Rensselaer Polytechnic Institute. His patent reflects work at the intersection of medical imaging and machine-learning-based image reconstruction. The supplied information does not specify his roles or dates at these organizations.

Collaborations

The listed coworkers associated with Xia are Grigorios Marios Karageorgos and Bruno De Man. Their names provide context for the professional network connected with his work, though specific collaboration details were not provided.

Conclusion

Wenjun Xia’s listed invention applies a denoising diffusion probabilistic model to reduce metal-related artifacts in CT images, contributing a machine-learning approach to medical image correction.