The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
May. 31, 2024
GE Precision Healthcare Llc, Waukesha, WI (US);
Rensselaer Polytechnic Institute, Troy, NY (US);
Grigorios Marios Karageorgos, Brooklyn, NY (US);
Bruno De Man, Clifton Park, NY (US);
Ge Wang, Loudonville, NY (US);
Wenjun Xia, Troy, NY (US);
Chuang Niu, Troy, NY (US);
GE Precision Healthcare LLC, Waukesha, WI (US);
Rensselaer Polytechnic Institute, Troy, NC (US);
Abstract
Various systems and methods are provided for MAR in CT images. A corrupted CT image, of a region of interest (ROI) of a subject, including artifacts caused by a metal object in the subject may be acquired. A corrupted sinogram including a corrupted region of corrupted data caused by the metal object and an uncorrupted region of uncorrupted data may be generated. A mask sinogram that delineates the corrupted region of the corrupted data may be generated. A corrected sinogram including the uncorrupted region of the uncorrupted data and an inpainted region of inpainted data corresponding to the corrupted region may be generated using a denoising diffusion probabilistic model, the corrupted sinogram, and the mask sinogram. A corrected CT image, of the ROI of the subject, that includes reduced artifacts relative to the artifacts in the corrupted CT image may be generated based on the corrected sinogram.