Company Filing History:
Years Active: 2021-2023
Title: Innovations of Wenjie Zhang in Microstructure Etching
Introduction
Wenjie Zhang is a notable inventor based in Wuhan, China. He has made significant contributions to the field of microstructure etching, holding 2 patents that showcase his innovative techniques. His work is primarily associated with Yangtze Memory Technologies Co., Ltd., where he continues to push the boundaries of technology.
Latest Patents
Wenjie Zhang's latest patents focus on an etching process that involves the in-situ formation of a protective layer. In this method, a mask is created on a microstructure over a substrate. The mask consists of a first pattern over a first region and a second pattern over a second region of the microstructure. A first etching process is conducted using an etching gas and a first bias voltage, which is applied according to the mask patterns. Following this, a protective layer is formed by using a deposition gas with a higher carbon to fluorine ratio than the etching gas. A second etching process is then performed to transfer the second pattern further into the microstructure. This innovative approach enhances the efficiency and effectiveness of the etching process.
Career Highlights
Wenjie Zhang has established himself as a key figure in the field of microstructure technology. His work at Yangtze Memory Technologies Co., Ltd. has been instrumental in advancing the company's research and development efforts. His innovative methods have not only contributed to the company's success but have also set new standards in the industry.
Collaborations
Wenjie Zhang collaborates with talented individuals such as Yu Wang and Hong Guang Song. These partnerships foster a creative environment that encourages the exchange of ideas and enhances the quality of their work.
Conclusion
Wenjie Zhang's contributions to microstructure etching through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the field and inspire future innovations.
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