This inventor holds 2 USPTO granted patents. Top assignee: National Cheng-Kung University. Active years: 2006-2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tainan, TW (2006)
- Pingtung, TW (2009)
Company Filing History:
Years Active: 2006-2009
Title: Weng-Chung Liao: Innovator in Imprint Lithography
Introduction
Weng-Chung Liao is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of imprint lithography, holding 2 patents that enhance the efficiency and effectiveness of this technology.
Latest Patents
One of his latest patents is titled "Imprint lithography utilizing silated acidic polymers." This invention involves a synthesis for a silated acidic polymer through the copolymerization of several monomers, including one acidic monomer and one silated monomer. The silated acidic polymer serves as a resist barrier in imprint lithography and can be easily removed using an environmental basic aqua-solution during the stripping process. This method eliminates the need for reactive ion etching (RIE) or organic solvents, thereby enhancing throughput and providing cost savings while maintaining good etching resistibility.
Another significant patent is the "Method for high aspect ratio pattern transfer." This invention describes a method that combines imprint and Step and Flash techniques to transfer high aspect ratio patterns. It effectively saves developing time and reduces the amount of developer used during the photo-resist pattern transfer process. The method also prevents separation and dissolution between the pattern and substrate, resulting in high aspect ratio patterns.
Career Highlights
Weng-Chung Liao is affiliated with National Cheng-Kung University, where he continues to advance research in his field. His work has garnered attention for its innovative approaches to lithography and pattern transfer.
Collaborations
He has collaborated with notable colleagues, including Min-Hsiung Hon and Chau-Nan Hong, contributing to the advancement of technology in imprint lithography.
Conclusion
Weng-Chung Liao's contributions to imprint lithography through his innovative patents demonstrate his commitment to enhancing technology in this field. His work not only improves efficiency but also offers cost-effective solutions for the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile