The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Jul. 14, 2005
Lien-chung Hsu, Tainan, TW;
Weng-chung Liao, Pingtung, TW;
Min-hsiung Hon, Tainan, TW;
Chau-nan Hong, Tainan, TW;
Lien-Chung Hsu, Tainan, TW;
Weng-Chung Liao, Pingtung, TW;
Min-Hsiung Hon, Tainan, TW;
Chau-Nan Hong, Tainan, TW;
National Cheng Kung University, Tainan, TW;
Abstract
A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile