Santa Clara, CA, United States of America

Wendell Boyd

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wendell Boyd. Retrieved from https://idiyas.com/inventor/wendell-boyd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Wendell Boyd in Electrostatic Chuck Technology

Introduction

Wendell Boyd is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of electrostatic chuck technology. His innovative work focuses on methods and apparatus that enhance the performance of electrostatic chucks.

Latest Patents

Wendell Boyd holds 1 patent for his invention titled "Methods for electrostatic chuck ceramic surfacing." This patent addresses the reduction of chucking abnormalities for electrostatic chucks by ensuring proper planarizing of ceramic surfaces. The method involves placing the electrostatic chuck assembly in a planarizing apparatus and altering its upper ceramic surface until specific S-parameter thresholds are met.

Career Highlights

Wendell Boyd is associated with Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has been instrumental in advancing technologies that improve manufacturing processes for electronic devices.

Collaborations

Wendell has collaborated with talented coworkers, including Michael Prestoza Decena and Stanley Wu. Their combined expertise contributes to the innovative environment at Applied Materials.

Conclusion

Wendell Boyd's contributions to electrostatic chuck technology exemplify the importance of innovation in the semiconductor industry. His patent reflects a commitment to enhancing manufacturing efficiency and precision.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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