Shenzhen, China

Wende Xie

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wende Xie. Retrieved from https://idiyas.com/inventor/wende-xie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Wende Xie: Innovator in Optical Flow Estimation

Introduction

Wende Xie is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of image processing and optical flow estimation. His innovative work has led to the development of a unique electronic device that enhances the accuracy of optical flow estimation.

Latest Patents

Wende Xie holds a patent for an "Electronic device for estimating optical flow and operating method thereof." This patent describes a method of estimating optical flow by processing two images separately. The method involves extracting feature maps, fusing attention feature maps, and generating attention feature maps based on the relationships within the images. This innovative approach improves the efficiency and accuracy of optical flow estimation.

Career Highlights

Wende Xie is currently employed at Samsung Electronics Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to collaborate with other talented individuals in the field, further enhancing his contributions to innovation.

Collaborations

Wende has worked alongside notable colleagues, including Zhaohui Lv and Pei You. Their collaborative efforts have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Wende Xie's contributions to optical flow estimation and image processing exemplify the spirit of innovation. His patent and ongoing work at Samsung Electronics Ltd. highlight his commitment to advancing technology in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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