Xiamen, China

Wen Wei Wang

This inventor holds 1 USPTO granted patent. Top assignee: United Semiconductor (Xiamen) Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen Wei Wang. Retrieved from https://idiyas.com/inventor/wen-wei-wang-loa73m3n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Wen Wei Wang in Semiconductor Fabrication

Introduction

Wen Wei Wang is a notable inventor based in Xiamen, China. He has made significant contributions to the field of semiconductor technology. His innovative approach to fabricating semiconductor devices has garnered attention in the industry.

Latest Patents

Wang holds a patent for a method of fabricating a semiconductor device using a patterned mask for forming hard masks on gate structures. This method involves providing a substrate with distinct transistor regions and forming gate structures that include hard masks of varying thicknesses. The process enhances the efficiency and effectiveness of semiconductor device fabrication.

Career Highlights

Wen Wei Wang is associated with United Semiconductor (Xiamen) Co., Ltd., where he applies his expertise in semiconductor technology. His work has contributed to advancements in the manufacturing processes of semiconductor devices.

Collaborations

Wang collaborates with talented individuals in his field, including Xiang Xiang Zhou and Xiang Wang. Their combined efforts foster innovation and drive progress in semiconductor research and development.

Conclusion

Wen Wei Wang's contributions to semiconductor fabrication exemplify the importance of innovation in technology. His patent and collaborative efforts highlight the ongoing advancements in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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