Wen-Tsung Chang

Title: The Innovations of Wen-Tsung Chang

Introduction

Wen-Tsung Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work focuses on the development of advanced electronic devices, particularly in the area of junction barrier Schottky diodes.

Latest Patents

Wen-Tsung Chang's latest patents include a method for fabricating a junction barrier Schottky diode device. This innovative device comprises an N-type semiconductor layer, multiple first P-type doped areas, and several second P-type doped areas, along with a conductive metal layer. The design features self-aligned second P-type doped areas positioned above the first P-type doped areas, with specific spacing that enhances device performance. This method represents a significant advancement in the fabrication of semiconductor devices.

Career Highlights

Throughout his career, Wen-Tsung Chang has worked with various companies, including Taipei Anjet Corporation. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to the development of cutting-edge electronic components.

Collaborations

Wen-Tsung Chang has collaborated with notable individuals in his field, including Nobuo Machida and Wen-Chin Wu. These partnerships have fostered innovation and have led to the successful development of new technologies.

Conclusion

Wen-Tsung Chang's contributions to semiconductor technology and his innovative patents highlight his role as a leading inventor in the industry. His work continues to influence the development of advanced electronic devices, showcasing the importance of innovation in technology.