Location History:
- Junghe, TW (2002)
- Chung-ho, TW (1999 - 2004)
Company Filing History:
Years Active: 1999-2004
Title: Innovations of Wen-Ten Chen
Introduction
Wen-Ten Chen is a notable inventor based in Chung-Ho, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of chemical mechanical polishing (CMP) processes.
Latest Patents
One of his latest patents is a contamination prevention system and method. This invention discloses a contamination prevention shield that cooperates with a high-pressure rinse apparatus to prevent contamination of particles within a CMP apparatus. The shield includes a cleaning cup, two vertical side shields, a front vertical shield, and a floor that work together to prevent fluid leakage during high-pressure rinsing. Additionally, a high-pressure rinse apparatus is connected to the shield, featuring a conduit with at least one nozzle for dispensing cleaning fluid during the rinse cycle. Another significant patent is the conformal disk holder for CMP pad conditioner. This device is designed to hold a rotating disk against the surface of a polishing pad. The conformal disk holder is particularly suited for use in CMP pad conditioning and is constructed with a cover member, a flexural plate member, and a base member. The design allows for a tilt of the base member, enhancing its functionality.
Career Highlights
Wen-Ten Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative patents have contributed to advancements in CMP technology, showcasing his expertise and commitment to improving manufacturing processes.
Collaborations
Wen-Ten has collaborated with several talented individuals, including Yao-Hsiang Liang and Chih-I Peng, who have also contributed to the field of semiconductor technology.
Conclusion
Wen-Ten Chen's contributions to semiconductor manufacturing through his innovative patents demonstrate his significant impact on the industry. His work continues to influence advancements in CMP processes, solidifying his reputation as a leading inventor in this field.