Taichung, Taiwan

Wen-Tane Liao

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Tane Liao. Retrieved from https://idiyas.com/inventor/wen-tane-liao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Wen-Tane Liao in Semiconductor Fabrication

Introduction

Wen-Tane Liao is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor fabrication. His innovative approach has led to the development of a unique method that enhances the efficiency of semiconductor processing.

Latest Patents

Wen-Tane Liao holds a patent for a "Semiconductor fabrication tool having gas manifold assembled by jig." This patent outlines a method of processing a semiconductor wafer, which includes several steps such as installing an upper lid, placing an inlet manifold on a water box, and supplying process gas over the semiconductor wafer through various channels. This invention aims to streamline the semiconductor manufacturing process, making it more effective and reliable.

Career Highlights

Wen-Tane Liao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Wen-Tane has collaborated with several talented individuals, including Ming-Che Chen and Ming-Hsien Lin. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Wen-Tane Liao's contributions to semiconductor fabrication demonstrate his commitment to innovation and excellence in technology. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving semiconductor processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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