Wen-Tai Chen

Title: The Innovations of Wen-Tai Chen

Introduction

Wen-Tai Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electronics, particularly in the development of thin film transistors. His innovative work has led to advancements in various electronic devices.

Latest Patents

Wen-Tai Chen holds a patent for a thin film transistor. This invention includes a substrate, a semiconductor layer, a gate insulating layer, a gate, a source, and a drain. The semiconductor layer is positioned above the substrate, while the gate insulating layer is located above the semiconductor layer. The gate overlaps with the semiconductor layer and consists of three portions. The first portion extends along the surface of the gate insulating layer and is in direct contact with it. The second portion is elevated above the first portion, and the third portion connects the first and second portions. The source and drain are electrically connected to the semiconductor layer, showcasing the intricate design and functionality of the transistor.

Career Highlights

Wen-Tai Chen is associated with Auo Corporation, where he continues to contribute to the field of electronics. His work has been instrumental in enhancing the performance and efficiency of electronic components.

Collaborations

Wen-Tai Chen has collaborated with several talented individuals, including Kuo-Jui Chang and Chi-Sheng Chiang. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Wen-Tai Chen's contributions to the field of thin film transistors exemplify the spirit of innovation. His work not only advances technology but also inspires future inventors in the electronics industry.