This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2019.
Company Filing History:
Years Active: 2019
Title: Innovations of Wen-Ta Liang in Photolithography
Introduction
Wen-Ta Liang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of advanced patterning techniques. His work is essential for the semiconductor manufacturing industry, where precision and accuracy are paramount.
Latest Patents
Wen-Ta Liang holds a patent for "Lithography patterning with sub-resolution assistant patterns and off-axis illumination." This innovative photolithography system includes a substrate stage for holding a workpiece and a mask featuring main patterns and sub-resolution assistant patterns. The system also incorporates a diffractive optical element (DOE) that directs radiation with an aerial image of the main patterns onto the workpiece. The DOE is designed with a first pair of poles positioned symmetrically about its center along a first direction, while the main patterns are oriented lengthwise along a second direction that is perpendicular to the first. The sub-resolution assistant patterns are aligned lengthwise along the first direction. This patent showcases his expertise in enhancing lithography techniques, which is crucial for the production of semiconductor devices.
Career Highlights
Wen-Ta Liang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His role in this prestigious company highlights his commitment to advancing technology and innovation in semiconductor manufacturing. His patent reflects his deep understanding of the complexities involved in photolithography and its applications in modern technology.
Collaborations
Wen-Ta Liang has collaborated with esteemed colleagues such as Chi-Yuan Sun and Yu-Chuan Yang. These collaborations have likely contributed to the innovative advancements in their respective fields, fostering a spirit of teamwork and shared knowledge.
Conclusion
Wen-Ta Liang's contributions to photolithography through his patent demonstrate his significant role in the semiconductor industry. His work not only enhances manufacturing processes but also paves the way for future innovations in technology.