Wen-Reng Huang

Title: Innovations of Wen-Reng Huang in Photomask Technology.

Introduction

Wen-Reng Huang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of photomask technology, particularly in the area of optical proximity correction.

Latest Patents

Huang holds a patent for an "OPC-like repair method for attenuated phase shift masks." This innovative process describes a new method for repairing an attenuated phase-shifting photomask. The method involves providing a contact hole pattern on the photomask and obtaining an aerial image of this pattern. The critical dimension of the contact hole pattern is predicted based on the intensity of the aerial image. Subsequently, the critical dimension is adjusted by forming non-printable optical proximity or scattering bar correction patterns around abnormal defects in the contact hole pattern. These non-printable correction patterns serve to enhance or cancel light intensity, effectively correcting the abnormal defects.

Career Highlights

Wen-Reng Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing photomask technology, which is crucial for the production of integrated circuits.

Collaborations

Huang collaborates with several talented individuals, including Same-Ting Chen and Wen-Hong Huang, who contribute to his research and development efforts.

Conclusion

Wen-Reng Huang's contributions to photomask technology through his innovative patent demonstrate his expertise and commitment to advancing the semiconductor industry. His work continues to influence the field significantly.