Location History:
- Hsinchu Hsien, TW (2004)
- Hwalien Hsien, TW (2006)
Company Filing History:
Years Active: 2004-2006
Title: The Innovative Contributions of Wen-Liang Huang
Introduction
Wen-Liang Huang, based in Hualien County, Taiwan, is a notable inventor known for his significant contributions in the field of plasma technology. With two patents to his name, Huang has demonstrated a strong commitment to advancing microwave applications through innovative designs and methodologies.
Latest Patents
Huang's latest inventions include the "Multiple Elliptical Ball Plasma Apparatus" and the "Directional Coupler for Microwave Cavities." The Multiple Elliptical Ball Plasma Apparatus is a sophisticated plasma generating device featuring numerous cavities shaped like half-ellipsoids. This invention utilizes the unique geometrical properties of electromagnetic wave propagation, creating a large plasma cavity by focusing microwaves within overlapping cavities. This design effectively enhances the volume of both the electromagnetic field and plasma produced.
His second patent, the Directional Coupler for Microwave Cavities, is engineered to guide microwave signal power in two directions. Comprised of first and second carriers, a micro strip line, a signal connector, and a metal shell, this device showcases a straightforward structure and efficient manufacturing process thanks to its print board technology.
Career Highlights
Wen-Liang Huang is affiliated with the Industrial Technology Research Institute, where he has dedicated his expertise to research and development in microwave technology. His work exemplifies the application of advanced engineering principles to solve complex technical challenges.
Collaborations
Throughout his career, Huang has worked alongside esteemed colleagues such as Chih-Chen Chang and Jen-Hui Tsai. Their collaborative efforts contribute to the advancements in the field, fostering an environment of innovation and creativity.
Conclusion
Wen-Liang Huang's innovative patents and collaborative spirit significantly enhance the field of plasma technology. Through his work at the Industrial Technology Research Institute, he continues to inspire future advancements and holds the potential to drive further innovations in microwave applications.