The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Aug. 13, 2003
Wen-liang Huang, Hwalien Hsien, TW;
Ting-wei Huang, Hsinchu, TW;
Jau-chyn Huang, Hsinchu, TW;
Ching-sung Hsiao, Hsinchu, TW;
Ju-chia Kuo, Pin-Cheng, TW;
Wen-Liang Huang, Hwalien Hsien, TW;
Ting-Wei Huang, Hsinchu, TW;
Jau-Chyn Huang, Hsinchu, TW;
Ching-Sung Hsiao, Hsinchu, TW;
Ju-Chia Kuo, Pin-Cheng, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A plasma generating device, has a plurality of cavities shaped like half-ellipsoids, a plasma cavity, and microwave sources. The present invention takes advantage of geometrical properties of the propagation of electromagnetic waves by enclosing an electromagnetic field in the microwave range in overlapping cavities that together are shaped like a plurality of half ellipsoids. Each of the cavities has a first focus and a second focus, with the first foci of the cavities place close to each other. Microwaves entering the cavities at the second foci propagate inside the cavity and are focused at the first foci. The area around the first foci of both half ellipsoids forms a plasma cavity, providing a large volume filled with a microwave field. Thereby an increased volume of an electromagnetic field and thus of a plasma is achieved.