Wen-Li Wu

Title: Innovations of Wen-Li Wu in X-ray Reflectometry

Introduction

Wen-Li Wu is a prominent inventor based in Hsinchu, Taiwan, known for his significant contributions to the field of X-ray reflectometry. With a total of eight patents to his name, he has developed innovative methods and apparatuses that enhance the measurement of three-dimensional nanostructures on flat substrates. His work is pivotal in advancing the capabilities of X-ray reflectometry, particularly in characterizing intricate nanostructures.

Latest Patents

One of Wen-Li Wu's latest patents is an X-ray reflectometry apparatus and method for measuring three-dimensional nanostructures on flat substrates. This invention includes an X-ray source, an X-ray reflector, a two-dimensional X-ray detector, and a two-axis moving device. The apparatus is designed to emit X-rays and reflect them onto a sample surface, allowing for the collection of reflecting X-ray signals. The two-axis moving device enables precise control of the detector's movement, facilitating accurate measurements based on the incident angle of the X-ray. Another notable patent addresses the challenges of applying X-ray reflectometry to samples with complex nanostructures, utilizing long-wavelength convergent X-rays for effective characterization.

Career Highlights

Wen-Li Wu has worked with esteemed organizations such as the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company. His experience in these institutions has allowed him to refine his expertise in X-ray reflectometry and contribute to groundbreaking research in nanotechnology.

Collaborations

Wen-Li Wu has collaborated with notable colleagues, including Wei-En Fu and Chun-Ting Liu. These partnerships have fostered a collaborative environment that enhances innovation and research in their respective fields.

Conclusion

Wen-Li Wu's contributions to X-ray reflectometry and nanotechnology are significant, showcasing his innovative spirit and dedication to advancing scientific understanding. His patents reflect a commitment to solving complex challenges in the measurement of nanostructures, making him a key figure in the field.