Wen-Hsien Liu

Title: Innovations of Wen-Hsien Liu in Semiconductor Technology

Introduction

Wen-Hsien Liu is a notable inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative approaches have led to advancements in semiconductor device fabrication methods.

Latest Patents

Wen-Hsien Liu holds a patent for a semiconductor device fabricating method. This method involves providing a substrate and forming a first gate insulating layer and a second gate insulating layer on the substrate. A gate layer is blanketly formed, and portions of the gate layer and insulating layers are removed to create a first gate and a second gate. The remaining insulating layers have specific thickness ratios, which are crucial for the device's performance.

Career Highlights

Wen-Hsien Liu is associated with Vanguard International Semiconductor Corporation, where he applies his expertise in semiconductor fabrication. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Wen-Hsien Liu has collaborated with notable colleagues, including Chih-Ping Lin and Shih-Ming Chen. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Wen-Hsien Liu's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patent and work at Vanguard International Semiconductor Corporation highlight his role as a key player in advancing semiconductor device fabrication methods.