Wen-Chin Chiou

Title: Innovations by Wen-Chin Chiou in Semiconductor Manufacturing

Introduction

Wen-Chin Chiou is a notable inventor based in Miaoli County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that focus on improving photolithographic processes and preventing corrosion in copper features during chemical mechanical polishing.

Latest Patents

Chiou's latest patents include a method for avoiding photoresist residue on semiconductor feature sidewalls. This innovative method enhances the photolithographic patterning process by preventing undeveloped photoresist contamination. The process involves several steps, including blanket depositing a polymeric resinous layer and curing it to initiate polymer cross-linking. Another significant patent focuses on preventing or reducing anodic copper corrosion during chemical mechanical polishing. This method provides a solution for maintaining the integrity of copper-filled features in semiconductor wafers during the polishing process.

Career Highlights

Wen-Chin Chiou is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work has been instrumental in advancing manufacturing techniques that enhance the quality and reliability of semiconductor devices.

Collaborations

Chiou has collaborated with several esteemed colleagues, including Hung-Wen Sue and Chung-Shi Liu. These collaborations have fostered an environment of innovation and have contributed to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Wen-Chin Chiou's contributions to semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor technology, ensuring improved processes and product quality.