Wen-Chen Wu

Title: Innovations of Wen-Chen Wu

Introduction

Wen-Chen Wu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of metal-oxide semiconductor transistors. With a total of 2 patents to his name, his work continues to influence advancements in this critical area of electronics.

Latest Patents

Wen-Chen Wu's latest patents include a method for fabricating a metal-oxide semiconductor (MOS) transistor. This innovative method involves several key steps: providing a semiconductor substrate, forming a silicon layer on the substrate, and performing a first photo-etching process to create a gate pattern. Additionally, an epitaxial layer is formed in the semiconductor substrate adjacent to the gate pattern, followed by a second photo-etching process to create a slot in the gate pattern, effectively separating it into two gates. This process enhances the efficiency and performance of MOS transistors.

Career Highlights

Wen-Chen Wu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His expertise in semiconductor fabrication has positioned him as a valuable asset to the organization. His contributions have not only advanced the company's technological capabilities but have also set new standards in the industry.

Collaborations

Wen-Chen Wu has collaborated with several talented individuals in his field, including Ming-Te Wei and Lung-En Kuo. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies in semiconductor fabrication.

Conclusion

Wen-Chen Wu's work in the field of semiconductor technology exemplifies the spirit of innovation. His patents and collaborations reflect a commitment to advancing technology and improving electronic devices. His contributions will undoubtedly continue to shape the future of the semiconductor industry.