Weiying Li

Title: Weiying Li: Innovator in H Bridge Circuit Technology

Introduction

Weiying Li is a notable inventor based in Beijing, China, recognized for his contributions to circuit technology. With a focus on enhancing the performance of H bridge circuits, his innovative work has garnered attention in the technical community.

Latest Patents

Weiying Li holds a patent for a "Gate driver circuit for H bridge circuit." This invention addresses significant challenges within conventional H bridge circuits, particularly concerning minority carrier injection and power dissipation. The patented technology features a gate driver circuit connected to the gate of an NMOS device, with an output voltage ranging from 0.1V to 0.4V during the dead time of the H bridge circuit. This advancement allows for biasing the gate voltage of the NMOS device efficiently, contrasting sharply with the V=0 state typically seen in traditional configurations.

Career Highlights

Currently, Weiying Li is employed by Freescale Semiconductor, Inc., where he continues to develop innovative solutions in semiconductor technology. His work, particularly in improving circuit designs, reflects a deep commitment to advancing engineering practices within the industry.

Collaborations

Weiying Li collaborates closely with his coworkers, Iven Zheng and Waley Li, who also contribute to the field of circuit technology. Their collective efforts highlight the importance of teamwork and shared knowledge in driving innovation forward.

Conclusion

Through his patent and commitment to engineering excellence, Weiying Li stands out as an influential figure in the realm of H bridge circuit technology. His innovations not only enhance circuit performance but also pave the way for future advancements in semiconductor designs.