Weiwei Wu

Title: Weiwei Wu: Innovator in Diagnostic Devices and Photomask Technology

Introduction

Weiwei Wu is a prominent inventor based in Shanghai, China. He has made significant contributions to the fields of diagnostic devices and photomask technology. With a total of 2 patents, his work reflects a commitment to innovation and improvement in medical and technological applications.

Latest Patents

Weiwei Wu's latest patents include a method of forming a photomask. This patent provides a photomask that achieves optimized uniformity through a simplified process flow. The photomask features a series of stair-like patterns that are parallel to each other. Each pattern consists of multiple first right angles on one side and second right angles on the opposite side, ensuring that these angles do not align on the same vertical axis. Another notable patent involves diagnostic devices with fluid reservoirs and associated methods and kits. This invention includes a housing base designed to retain a test strip and a housing cover that couples to the base to partially enclose the test strip. The cover features a fluid reservoir for hydrating a sample swab, along with an aperture for transferring the sample onto the test strip.

Career Highlights

Throughout his career, Weiwei Wu has worked with several notable companies, including Global Diagnostic Systems, Benefit LLC, and Fujian Jinhua Integrated Circuit Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Weiwei Wu has collaborated with various professionals in his field, including Wendy Strongin and Elliott Millenson. These partnerships have contributed to the advancement of his projects and inventions.

Conclusion

Weiwei Wu stands out as an influential inventor whose work in diagnostic devices and photomask technology continues to impact the industry. His innovative patents and collaborations highlight his dedication to advancing technology for better solutions.