The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Mar. 23, 2021
Applicant:
Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, CN;
Inventors:
Weiwei Wu, Shanghai, CN;
Hsiang-Yu Hsieh, Miaoli County, TW;
Assignee:
Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, CN;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); G03F 1/36 (2012.01); H01L 21/027 (2006.01); G06F 30/398 (2020.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G06F 30/398 (2020.01); H01L 21/0274 (2013.01);
Abstract
The present disclosure provides a photomask and a method of forming a photomask, in which the photomask may obtain an optimized uniformity via a simplified process flow. The photomask includes a plurality of stair-like patterns parallel disposed with each other, wherein each of the stair-like patterns includes a plurality of first right angles at one side and a plurality of second right angle at another side opposite to the side, and each of the first right angles and each of the second right angles are not in a same vertical axis.