Weiting Chen

Title: Weiting Chen: Innovator in Substrate Processing Technology

Introduction

Weiting Chen is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing, particularly through his innovative methods that enhance efficiency and effectiveness in this area.

Latest Patents

Weiting Chen holds a patent for a substrate processing method. This method involves a first process of supplying a first gas to a substrate, followed by a second process of supplying a second gas to the substrate. The method is designed to optimize the distance from the edge of the substrate to the boundary between the processing space and the gas exhaust space. By adjusting parameters such as the cross-sectional area and supply flow rate, the method ensures that the Peclet number exceeds 1, which is crucial for effective gas diffusion.

Career Highlights

Weiting Chen is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on developing advanced technologies that improve substrate processing techniques. His expertise and innovative approach have positioned him as a valuable asset to his team and the company.

Collaborations

Weiting Chen collaborates with Takahiko Kato, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of substrate processing technology.

Conclusion

Weiting Chen's contributions to substrate processing technology exemplify the spirit of innovation. His patent and ongoing work at Tokyo Electron Limited highlight his commitment to advancing the field. Through collaboration and dedication, he continues to make a significant impact in the industry.