Weiqiang Qian

Title: Weiqiang Qian: Innovator in Photosensitive Resin Technology

Introduction

Weiqiang Qian is a notable inventor based in Hangzhou, China. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His innovative work has led to advancements in various applications, including dry film resist technology.

Latest Patents

Weiqiang Qian holds a patent for a photosensitive resin composition and its use. The patent details a resin composition that includes 40-70 parts by weight of an alkali-soluble resin, 20-50 parts by weight of a photopolymerizable monomer, 0.5-10.0 parts by weight of a photoinitiator, and 0.1-10.0 parts by weight of additives. Notably, the photopolymerizable monomer contains 0.5-15.0 parts by weight of a monomer with a carbonate structure. This innovative resin composition is primarily utilized as a dry film resist.

Career Highlights

Throughout his career, Weiqiang Qian has worked with several prominent companies. He has been associated with the Zhejiang First Advanced Material R&D Institute Co., Ltd. and Hangzhou First Electronic Material Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials development and innovation.

Collaborations

Weiqiang Qian has collaborated with notable colleagues in his field, including Gaohua Zhu and Guangda Zhou. These partnerships have contributed to the advancement of research and development in photosensitive materials.

Conclusion

Weiqiang Qian's contributions to the field of photosensitive resin technology highlight his innovative spirit and dedication to advancing material science. His patent and career achievements reflect his significant impact on the industry.