The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Jul. 10, 2020
Applicant:

Zhejiang First Advanced Material R&d Institute Co., Ltd., Hangzhou, CN;

Inventors:

Gaohua Zhu, Hangzhou, CN;

Weijie Li, Hangzhou, CN;

Rongbai Tong, Hangzhou, CN;

Weiqiang Qian, Hangzhou, CN;

Guangda Zhou, Hangzhou, CN;

Jianhua Lin, Hangzhou, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 69/00 (2006.01); C08G 64/02 (2006.01); C08G 64/06 (2006.01); G03F 7/033 (2006.01);
U.S. Cl.
CPC ...
C08L 69/00 (2013.01); C08G 64/0208 (2013.01); C08G 64/0291 (2013.01); C08G 64/06 (2013.01); G03F 7/033 (2013.01);
Abstract

The present disclosure discloses a photosensitive resin composition and a use the same. The resin composition of the present disclosure includes 40-70 parts by weight of an alkali-soluble resin, 20-50 parts by weight of a photopolymerizable monomer, 0.5-10.0 parts by weight of a photoinitiator, and 0.1-10.0 parts by weight of additives. The photopolymerizable monomer includes 0.5-15.0 parts by weight of a monomer containing carbonate structure. The photosensitive resin composition is used as a dry film resist.


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