Hangzhou, China

Weijie Li


 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Weijie Li: Pioneering Innovations in Photosensitive Resin Compositions

Introduction: Weijie Li is an innovative inventor based in Hangzhou, China, known for his contributions to advanced materials technology. With a keen focus on developing cutting-edge materials, he holds a notable patent that enhances the functionality of photosensitive resin compositions, which are essential in various manufacturing processes.

Latest Patents: Weijie Li holds a patent for a "Photosensitive Resin Composition and Use Thereof." This invention involves a unique resin composition that comprises 40-70 parts by weight of an alkali-soluble resin, 20-50 parts by weight of a photopolymerizable monomer, 0.5-10.0 parts by weight of a photoinitiator, and 0.1-10.0 parts by weight of additives. Particularly significant is the inclusion of a monomer containing a carbonate structure, which constitutes 0.5-15.0 parts by weight of the photopolymerizable monomer. This innovative resin composition is designed for use as a dry film resist, advancing the efficiency and performance of photolithography applications.

Career Highlights: Weijie Li is currently affiliated with the Zhejiang First Advanced Material Research and Development Institute Co., Ltd., a leading company in materials innovation. His work at this institute emphasizes the development of materials that meet modern industrial requirements. The institute's focus on advanced materials positions Li at the forefront of research and development in his field.

Collaborations: Throughout his career, Weijie Li has collaborated with notable colleagues, including Gaohua Zhu and Rongbai Tong. Together, they contribute to the research efforts at the Zhejiang First Advanced Material Research and Development Institute, driving innovations in materials science and expanding the horizons of technology.

Conclusion: Weijie Li exemplifies the spirit of innovation in the realm of materials science with his patented work on photosensitive resin compositions. His contributions not only enhance current manufacturing processes but also lay the groundwork for future advancements in this essential field. As he continues his work at the Zhejiang First Advanced Material Research and Development Institute, the impact of his inventions is sure to be felt across various industries.

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