Company Filing History:
Years Active: 2023
Title: The Innovations of Gaohua Zhu: A Pioneer in Photosensitive Resin Technology
Introduction
Gaohua Zhu is an accomplished inventor based in Hangzhou, China, recognized for his innovative contributions to materials science. With a focus on the development of photosensitive resin compositions, his work plays a significant role in advancing technologies related to dry film resists.
Latest Patents
Zhu holds a notable patent for a photosensitive resin composition, which has gained attention for its unique formulation. The resin composition includes 40-70 parts by weight of an alkali-soluble resin, 20-50 parts by weight of a photopolymerizable monomer, 0.5-10.0 parts by weight of a photoinitiator, and 0.1-10.0 parts by weight of additives. Notably, the photopolymerizable monomer comprises 0.5-15.0 parts by weight of a monomer containing a carbonate structure. This innovative resin composition is specifically utilized as a dry film resist, showcasing its practical applications in the industry.
Career Highlights
Gaohua Zhu is affiliated with the Zhejiang First Advanced Material R&D Institute Co., Ltd., where he continues to pursue research and development in advanced materials. His dedication to innovation has earned him recognition among peers and within the field of materials science.
Collaborations
Throughout his career, Zhu has collaborated with esteemed colleagues, including Weijie Li and Rongbai Tong. These partnerships highlight the importance of teamwork in driving forward research and patented innovations in their area of expertise.
Conclusion
Gaohua Zhu's contributions to the field of photosensitive resin technology exemplify the power of innovation in material science. With a focus on creating effective solutions for dry film resists, his work continues to inspire advancements within the industry, showcasing the importance of inventors in shaping the future of technology.