Chengdu, China

Weimin Xie

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Chinese Academy of Sciences. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Weimin Xie. Retrieved from https://idiyas.com/inventor/weimin-xie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Weimin Xie: Innovator in Detection Devices

Introduction

Weimin Xie is a notable inventor based in Chengdu, China. He has made significant contributions to the field of detection devices, particularly through his innovative patent. His work focuses on utilizing diffraction wavefronts for precise measurements of surface shapes.

Latest Patents

Weimin Xie holds a patent titled "Detection devices and methods using diffraction wavefront of a pinhole stitching measurement of surface shape." This patent describes a sophisticated method for measuring surface shapes using a series of optical components, including laser light, filters, and lenses. The technology allows for accurate measurements by analyzing the diffraction patterns generated by a pinhole.

Career Highlights

Throughout his career, Weimin Xie has worked with esteemed organizations such as the Chinese Academy of Sciences and Gd Midea Heating & Ventilating Equipment Co., Ltd. His experience in these institutions has contributed to his expertise in optical measurement technologies.

Collaborations

Weimin Xie has collaborated with talented individuals in his field, including coworkers Xin Jia and Jiajun Xu. Their combined efforts have further advanced the development of innovative detection devices.

Conclusion

Weimin Xie's contributions to the field of detection devices highlight his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his significant impact on optical measurement methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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