The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Apr. 24, 2015
Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, CN;
Xin Jia, Chengdu, CN;
Jiajun Xu, Chengdu, CN;
Fuchao Xu, Chengdu, CN;
Weimin Xie, Chengdu, CN;
Tingwen Xing, Chengdu, CN;
Abstract
The present disclosure provides detection devices and methods using a diffraction wavefront of a pinhole stitching measurement of surface shape. The light emitted from the laser passes through a filter hole, a first condenser lens, a spatial filter, a beam expander, a half wave plate, a λ/4 wave plate, an attention plate and then is transmitted through a beam splitter, reflected by a reflecting mirror and is irradiated onto an pinhole through a first optical adjustable shelf and a second set of condenser lens. A part of diffraction light generated by the pinhole is irradiated to the mirror to be measured; the light reflected by the mirror to be measured is reflected by a frame of the pinhole and generate a diffraction fringe along with another part of the diffraction wavefront of the pinhole. The interference fringe is focused by the third set of condenser lens on the third optical adjustable shelf and is collected by the CCD detector. The mirror to be measured is positioned on the second optical adjustable shelf and may be moved along a normal direction of the mirror to be measured to implement an annular aperture stitching measurement. Meanwhile, the first optical adjustable shelf may be rotated and moved in translation to measure the mirror by a scanning sub apertures stitching measurement.
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