Weimin Li

Title: Weimin Li: Innovator in Extreme Ultraviolet Technology

Introduction

Weimin Li is a prominent inventor based in Singapore, known for his contributions to the field of extreme ultraviolet (EUV) technology. With a total of 5 patents, he has made significant advancements that enhance the manufacturing processes of EUV mask blanks and multilayer stacks.

Latest Patents

Among his latest patents is the "Extreme ultraviolet mask blank defect reduction," which discloses methods for manufacturing EUV mask blanks. This innovative method focuses on smoothing out surface defects on the substrate, thereby improving the quality of the mask blanks. Another notable patent is the "Graded interface in Bragg reflector," which describes a multilayer stack in the form of a Bragg reflector. This invention includes a graded interfacial layer that eliminates low-reflectivity interfaces and reduces roughness in multilayer stacks.

Career Highlights

Weimin Li is currently employed at Applied Materials, Inc., where he continues to push the boundaries of technology in his field. His work has been instrumental in advancing the capabilities of EUV lithography, which is crucial for the semiconductor industry.

Collaborations

Weimin collaborates with talented individuals such as Wen Xiao and Vibhu Jindal, contributing to a dynamic and innovative work environment.

Conclusion

Weimin Li's contributions to EUV technology and his innovative patents reflect his dedication to advancing the field. His work at Applied Materials, Inc. positions him as a key player in the ongoing evolution of semiconductor manufacturing.