The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Nov. 30, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Weimin Li, Singapore, SG;

Wen Xiao, Singapore, SG;

Vibhu Jindal, San Jose, CA (US);

Sanjay Bhat, Singapore, SG;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); G03F 1/24 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G03F 1/24 (2013.01); G03F 7/7085 (2013.01); G01N 2021/95676 (2013.01);
Abstract

Apparatus and methods for measuring surface topography are described. The analysis apparatus and methods detect light reflected from the reflective backside of a cantilever assembly including a tip, calculate a background level (BGL) value obtained from an optical scan of a reference sample using a power spectral density (PSD) value obtained from a topographical scan of a reference sample to generate a correlational coefficient between the BGL and the PSD values. The correlational coefficient between the BGL and PSD values is used to measure the BGL value of additional EUV mask blanks by a topographical scan of the EUV mask blanks using the same tip mounted to the cantilever.


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