This inventor holds 1 USPTO granted patent. Top assignee: The 13Th Research Institute of China Electronics. Active years: 2021.
Company Filing History:
Years Active: 2021
Title: Weili Lu: Innovator in Silicon Carbide Technology
Introduction
Weili Lu, based in Shijiazhuang, China, is a distinguished inventor known for his contribution to the semiconductor industry. With one patent to his name, Lu has made significant strides in the field of silicon carbide technology. His work aims to enhance the quality and efficiency of semiconductor devices.
Latest Patents
Lu's notable invention is a patent for a "Method for Passivating Silicon Carbide Epitaxial Layer." This patent addresses the technical challenges in semiconductor fabrication. The disclosed method involves introducing a carbon source and a silicon source into a reaction chamber to grow a silicon carbide epitaxial layer on a substrate. Subsequently, the carbon source is turned off, and a nitrogen source is introduced alongside a silicon source to grow a silicon nitride thin film on the silicon carbide epitaxial layer. This innovative process leads to a silicon nitride thin film that has minimal defects and high quality, making it suitable as a lower dielectric layer for gate electrodes in field effect transistors. Notably, this method eliminates the need for an additional oxidation process to create a SiO dielectric layer, thus streamlining the device fabrication procedures.
Career Highlights
Weili Lu is affiliated with the 13th Research Institute of China Electronics, where he engages in cutting-edge research and development. His work has not only contributed to the institute's reputation but also advanced the capabilities of semiconductor technologies.
Collaborations
Throughout his career, Lu has collaborated with esteemed colleagues such as Jia Li and Yulong Fang. These collaborations foster a dynamic research environment, allowing for the exchange of ideas and the pursuit of innovative solutions in the semiconductor field.
Conclusion
Weili Lu’s contributions to semiconductor technology, particularly through his innovative patent for passivating silicon carbide epitaxial layers, exemplify the vital role of inventors in advancing technology. His work at the 13th Research Institute of China Electronics continues to inspire future developments in the industry.