San Jose, CA, United States of America

Weidong Li

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.0

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2010-2016

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4 patents (USPTO):

Title: Innovations of Weidong Li in Silicon-Based Nanoparticle Inks

Introduction

Weidong Li is a prominent inventor based in San Jose, California, known for his contributions to the field of silicon-based nanoparticle inks. With a total of four patents to his name, he has made significant advancements in the formulation and application of these innovative inks.

Latest Patents

Li's latest patents focus on the development of printable inks that utilize silicon and germanium-based nanoparticles combined with high viscosity alcohol solvents. These inks are designed to control the rheology, allowing them to be formulated into pastes with non-Newtonian properties suitable for screen printing. The low metal contamination in these inks makes them ideal for forming semiconductor structures. Additionally, his patents describe laser pyrolysis reactor designs that enhance the synthesis of elemental silicon particles, ensuring effective nucleation and quenching through the use of inert gases. Improved silicon nanoparticle inks are also detailed, which do not require surface modification with organic compounds, providing flexibility for various printing applications.

Career Highlights

Weidong Li is currently employed at Nanogram Corporation, where he continues to innovate in the field of nanoparticle inks. His work has been instrumental in advancing the technology used in semiconductor manufacturing and printing applications.

Collaborations

Li has collaborated with notable colleagues such as Shivkumar Chiruvolu and Igor Altman, contributing to the development of cutting-edge technologies in his field.

Conclusion

Weidong Li's work in silicon-based nanoparticle inks represents a significant advancement in materials science and printing technology. His innovative patents and contributions continue to shape the future of semiconductor applications.

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